Ti(t)/Co(54nm)/Ti(t)纳米薄膜的制备和磁特性

Fabrication and Magnetic Properties of Ti(t)/Co(54nm)/Ti(t) Thin Films

应用对靶磁控溅射法在玻璃基底上制备了Ti(t)/Co(54 nm)/Ti(t)(t=5,10,15,20,25 nm)纳米薄膜,研究了非磁性Ti层厚度对样品磁特性的影响.实验结果显示,Ti(5 nm)/Co(54 nm)/Ti(5 nm)样品的垂直膜面矫顽力高达159 kA.m-1.研究表明,如此高的矫顽力主要源于样品晶粒的磁晶各向异性.另外,非磁性Ti原子的扩散在一定程度上减小了磁性颗粒间的交换相互作用,导致出现大的矫顽力.

Ti（t）/Co（54 nm）/Ti（t）（t=5,10,15,20,25 ）thin films were fabricated by DC magnetron sputtering method onto glass substrates. Effects of Ti layer thickness on magnetic properties of Ti（ t nm）/Co（54 nm）/Ti（ t nm） films were studied. Magnetic measurements proved that Ti（5 nm）/Co（54 nm）/Ti（5 nm） showsa great out-of-plane coercivity about 159 kA·m-1 ,which may be originated from magneto-crystalline anisotropy of particles and diffusion of Ti atoms.