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Analysis of laser induced thermal mechanical relationship of HfO_2/SiO_2 high reflective optical thin film at 1064 nm 被引量：6

Analysis of laser induced thermal mechanical relationship of HfO_2/SiO_2 high reflective optical thin film at 1064 nm
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摘要 A numerical model is developed for the calculation of transient temperature field of thin film coating induced by a long-pulsed high power laser beam. The electric field intensity distribution of HfO2/Si02 high reflective （HR） film is investigated to calculate the thermal field of the film. The thermal-mechanical relationships are discussed to predict the laser damage area of optical thin film under long pulse high energy laser irradiation. A numerical model is developed for the calculation of transient temperature field of thin film coating induced by a long-pulsed high power laser beam. The electric field intensity distribution of HfO2/Si02 high reflective （HR） film is investigated to calculate the thermal field of the film. The thermal-mechanical relationships are discussed to predict the laser damage area of optical thin film under long pulse high energy laser irradiation.
作者 戴罡 陈彦北 陆建 沈中华 倪晓武
机构地区 School of Science
出处 《Chinese Optics Letters》 SCIE EI CAS CSCD 2009年第7期601-604,共4页 中国光学快报（英文版）
关键词 Electric fields Hafnium compounds High energy lasers High power lasers LASERS Pulsed laser applications Silicon compounds Thin film devices Thin films Electric fields Hafnium compounds High energy lasers High power lasers Lasers Pulsed laser applications Silicon compounds Thin film devices Thin films
分类号 TN249 [电子电信—物理电子学]
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同被引文献31

引证文献6

二级引证文献17

Chinese Optics Letters
2009年 第7期

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