摘要
The electron thermalization and relaxation processes in ferromagnetic nickel thin film and micro-nano- structure film have been studied by measuring the transient change after excitation by a femtosecond laser pulse. The measurements indicate that the electron thermalization time is between 18 and 47 fs. This is somewhat faster than the value reported before. And the thermalization time of the micro-nano-structure film is much longer than the nickel film. We deduce that it is caused by the discontinuity of the electron band close to the Fermi level in the micro-nano-structure nickel film.
The electron thermalization and relaxation processes in ferromagnetic nickel thin film and micro-nano- structure film have been studied by measuring the transient change after excitation by a femtosecond laser pulse. The measurements indicate that the electron thermalization time is between 18 and 47 fs. This is somewhat faster than the value reported before. And the thermalization time of the micro-nano-structure film is much longer than the nickel film. We deduce that it is caused by the discontinuity of the electron band close to the Fermi level in the micro-nano-structure nickel film.
基金
supported by the National Natural Science Foundation of China under Grant Nos. 50575100 and 50775104
