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Improved dual-channel 4H-SiC MESFETs with high doped n-type surface layers and step-gate structure

Improved dual-channel 4H-SiC MESFETs with high doped n-type surface layers and step-gate structure
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摘要 An improved dual-channel 4H-SiC MESFET with high doped n-type surface layer and step-gate structure is proposed, and the static and dynamic electrical performances are analyzed.A high doped n-type surface layer is applied to obtain a low source parasitic series resistance, while the step-gate structure is utilized to reduce the gate capacitance by the elimination of the depletion layer extension near the gate edge, thereby improving the RF characteristics and still maintaining a high breakdown voltage and a large drain current in comparison with the published SiC MESFETs with a dual-channel layer.Detailed numerical simulations demonstrate that the gate-to-drain capacitance, the gate-to-source capacitance, and the source parasitic series resistance of the proposed structure are about 4%, 7%, and 18% smaller than those of the dual-channel structure, which is responsible for 1.4 and 6 GHz improvements in the cut-off frequency and the maximum oscillation frequency. An improved dual-channel 4H-SiC MESFET with high doped n-type surface layer and step-gate structure is proposed, and the static and dynamic electrical performances are analyzed.A high doped n-type surface layer is applied to obtain a low source parasitic series resistance, while the step-gate structure is utilized to reduce the gate capacitance by the elimination of the depletion layer extension near the gate edge, thereby improving the RF characteristics and still maintaining a high breakdown voltage and a large drain current in comparison with the published SiC MESFETs with a dual-channel layer.Detailed numerical simulations demonstrate that the gate-to-drain capacitance, the gate-to-source capacitance, and the source parasitic series resistance of the proposed structure are about 4%, 7%, and 18% smaller than those of the dual-channel structure, which is responsible for 1.4 and 6 GHz improvements in the cut-off frequency and the maximum oscillation frequency.
出处 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2009年第7期39-43,共5页 半导体学报(英文版)
基金 supported by the State Key Development Program for Basic Research of China(No.51327010101)
关键词 high doped surface layer step-gate 4H-SiC MESFETs high doped surface layer step-gate 4H-SiC MESFETs
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参考文献10

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