磁控溅射MoS_2/WS_2复合薄膜的工艺与摩擦学性能研究

Growth and Mechanical Properties of MoS_2/WS_2 Composite Films by Magnetron Sputtering

采用MoS2/WS2复合靶材在不锈钢和硅基片上溅射MoS2/WS2纳米薄膜,通过多次实验,得到溅射MoS2/WS2薄膜的最佳工艺如下:溅射气压4.0Pa,靶基距为70mm,溅射功率为150W,溅射时间为3h。使用X-射线衍射仪,能谱仪,扫描电子显微镜对薄膜的成分和结构进行分析。采用HH-3000薄膜结合强度划痕试验仪,纳米压痕测试系统,UNT-3摩擦磨损试验机对薄膜进行机械性能和摩擦磨损性能分析,结果表明:在大气环境中,WS2/MoS2复合薄膜摩擦性能要优于纯MoS2薄膜。

The MoS2/WS2 composite nano-films were grown by electron cyclotron resonance（ECR）and DC magnetron sputtering on substrates of stainless steel and silicon. The influence of the film growth conditions on film quality was studied. The microstructures and mechanical properties were characterized with X-ray diffraction（XRD）, X-ray energy dispersive spectroscopy（EDS）, scanning electron microscopy（SEM）and conventional surface probes. The results show that in ambient air. the MoSE/WS2 composite film has a lower friction but higher wear resistance than MoS2 film does. and that good MoS2/WS2 composite films can be grown under optimized growth conditions, including an argon pressure of 4.0Pa, a separation between target and substrate of 70 mm and a sputtering time of 3h.