摘要
Fe-doped amorphous carbon films of about lOOnm in thickness are deposited on n-type silicon substrates by pulsed laser deposition （PLD）, and positive magnetoresistance （MR） is observed for these Fe-doped amorphous carbon/n-Si heterostructures under current-perpendicular-to-plane configuration at forward bias. Two MR peaks are observed in the temperature range 40-120 K and the positive MR varies with applied bias voltage. This bias voltage controlled MR may be related to the maguetic-field-controlled freeze out effect and recombination through the deep trapping states in the Fe-doped carbon films.
Fe-doped amorphous carbon films of about lOOnm in thickness are deposited on n-type silicon substrates by pulsed laser deposition （PLD）, and positive magnetoresistance （MR） is observed for these Fe-doped amorphous carbon/n-Si heterostructures under current-perpendicular-to-plane configuration at forward bias. Two MR peaks are observed in the temperature range 40-120 K and the positive MR varies with applied bias voltage. This bias voltage controlled MR may be related to the maguetic-field-controlled freeze out effect and recombination through the deep trapping states in the Fe-doped carbon films.
基金
Supported by the National Natural Science Foundation of China under Grant Nos U0734001 and 50772054, and the National Basic Research Program of China under Grant Nos 2008CB617601 and 2009CB929202.
