微等离子体氧化技术的研究进展

Research Development of Micro Plasma Oxidation Technology

微等离子体氧化技术是一种直接在铝、镁、钛等有色金属表面原位生长陶瓷膜层的材料表面改性技术。介绍微等离子体氧化技术的发展历史及研究现状,讨论应用微等离子体氧化技术制备陶瓷膜的基本原理和制备方法以及膜层生长速度和性能的影响因素,并从专利技术和国家自然科学基金资助等方面对微等离子体氧化技术的研究重点和方向进行综述。

Micro plasma oxidation is a measure of materials surface modification technology which can directly produce the ceramic film on the surfaces of some nonferrous metals such as Al, Mg, Ti. The development history and the research development of micro plasma oxidation are introduced; the basic principle and producing method of micro plasma oxidation ceramic film are discussed, and the influencing factors to growth rate and performance of ceramic film are described. Finally, from two aspects of the patented technology and national natural science foundation, research emphasis and direction about micro plasma oxidation technology are summarized.