期刊文献+

大气压等离子体沉积棉织物类氧化硅薄膜(英文)

SiO_x-like coating on cotton fabric by atmospheric pressure plasma
下载PDF
导出
摘要 使用特殊的等离子体处理前HMDSO单体表面吸附和干燥的方法处理棉织物,通过大气压等离子体技术,成功地在棉织物表面沉积类氧化硅等离子体薄膜.使用SEM和FTIR分析了棉织物表面薄膜的形貌和化学结构.结果表明,棉纤维表面包覆了一层均匀连续的颗粒堆积薄膜,该薄膜中包含Si—O—Si和Si—O—C官能团.由于等离子体无机类氧化硅涂层,提高了棉织物的抗紫外和耐洗牢度. Plasma treated cotton fabric is generated at atmosphere by a special pretreated method of HMDSO absorb and dry. The surface morphology and chemical structure of plasma treated cotton fabrics are analyzed by SEM and FrIR analysis. The results show that a SiOx-like film from the staring monomer of HMDSO is successfully deposited on cotton fabric at atmospheric pressure. This inorganic film is a particulate-accumulated film which contained Si-O-Si and Si-O-C functional groups, The UVabsorption and wash fastness of cotton fabrics are also greatly enhanced after this pretreat and plasma modification.
出处 《西安工程大学学报》 CAS 2009年第2期370-373,共4页 Journal of Xi’an Polytechnic University
基金 Supported by the Foundation of the Educational Department of Liaoning Province(05L083)
关键词 大气压等离子体 棉织物 薄膜 plasma at atmospheric pressure cotton fabric coating
  • 相关文献

参考文献4

  • 1WALID A daoud,JOHN H Xin.Low temperature sol-gel processed photocatalytic Titania coating[J].J Sol-Gel Sci Technol,2004,29:25-29.
  • 2KANG M S,CHUNG T H,KIM Y.Plasma enhanced chemical vapor deposition of nitrogen-incorporated silicon oxide films using TMOS/N2O gas[J].Thin Solid Films,2004,506-507:45-49.
  • 3BOZZI T,YURANOVA J,KIM Y.Self-cleaning of wool-polyamide and polyester textiles by TiO2-ruitle modification under daylight irradiation at ambient temperature[J].J photochem Photobiol A,2005,172:27-34.
  • 4SAHLI S,REBIAI S,RAYNAUD P,et al.Deposition of SiO2-like films by HMDSO/O2 plasma at low pressure in a MMP-DE-CR reactor[J].Plasma and Polymer,2002(7):327-340.

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部