摘要
研究了络合剂加量、镀液pH、温度等因素对非晶态Ni-W合金镀层电沉积的影响.同时对非晶态镀层结构、结合力和耐蚀性也作了探讨.结果表明:各因素对电沉积都有不同程度的影响,其中氨基络合物加量为0.74~1.11mol/L时,合金镀层稳定,W含量大于44%的合金镀层为非晶态.有优异的耐蚀性,并且在不同材质上具有良好的结合力.
Effects of addition amount of complexing agent,pH value of plating solution and temperature on electro deposit of Ni W alloy were studied. The influence on the adhasive force between the matrix and the coating of amorphous Ni W alloy, and corrosion resistance were also discussed, the results showed that each factor had different degree of influence on electro deposit. When the addition of ammine complexes was 0.74~1.11 mol/L, the coating was stable, when the content of W was over 44%, the coating became amorphous, which had good corrosion resistance, and high adhesion with different materials.
出处
《腐蚀科学与防护技术》
CAS
CSCD
1998年第3期159-162,共4页
Corrosion Science and Protection Technology
关键词
电沉积
非晶态
镍钨合金
合金镀层
coating of Ni W alloy, electro deposit, character of coating