非晶态Ni-W合金镀层电沉积影响因素和特性的研究

AMORPHOUS Ni W ALLOY COATING BY ELECTRO DEPOSIT AND ITS CHARACTERISTICS

研究了络合剂加量、镀液ｐＨ、温度等因素对非晶态Ｎｉ－Ｗ合金镀层电沉积的影响．同时对非晶态镀层结构、结合力和耐蚀性也作了探讨．结果表明：各因素对电沉积都有不同程度的影响，其中氨基络合物加量为０．７４～１．１１ｍｏｌ／Ｌ时，合金镀层稳定，Ｗ含量大于４４％的合金镀层为非晶态．有优异的耐蚀性，并且在不同材质上具有良好的结合力．

Effects of addition amount of complexing agent,pH value of plating solution and temperature on electro deposit of Ni W alloy were studied. The influence on the adhasive force between the matrix and the coating of amorphous Ni W alloy, and corrosion resistance were also discussed, the results showed that each factor had different degree of influence on electro deposit. When the addition of ammine complexes was 0.74～1.11 mol/L, the coating was stable, when the content of W was over 44%, the coating became amorphous, which had good corrosion resistance, and high adhesion with different materials.