金刚石膜与硬质合金基体间的界面状态

STUDY ON THE INTERMCIAL MORPHOLOGY AND STRUCTURE OF DIAMOND THIN FILM-CEMENTED CARBIDE SUBSTRATE

采用SEM，TEM对金刚石膜-硬质合金基体横截面的形态进行了研究，探讨了甲烷含量对CVD金刚石膜-基横截面各组织层次的影响结果表明。

The cross-sectional morphologies and microstructures of CVD diamond thin films synthesized onto the cobalt cemented tungsten carbide (YGS) substrate have been observed by means of SEM and TEM. The results show that after chemically cobalt-removed and plasma-etching decarbonized treatments the sequence of cross-sectional structure is as follows:diamond thin film, graphite carbon thin film, small WC grains layer; retained decarbonized layer (W and η phases), residual porous layer, YG8 cemented carbide substrate. Methane concentrations have obvious influences on the formation and thickness of above-mentioned layers.