摘要
通过偶接金属铝,采用化学沉积方法制备Fe-W-P三元合金镀层,研究了镀液的组成对Fe-W-P合金化学沉积行为的影响。结果表明:在一定范围内增大镀液中NaOH和还原剂NaH2PO2·H2O的浓度,沉积速率增大,而随着钨酸钠的加入镀层的沉积速率稍有下降,表明钨酸钠对Fe-W-P的化学沉积有一定的抑制作用。
The ternary Fe-W-P film were prepared by means of electroless deposition on brass substrate coupled with aluminum from the bath. The deposition behavior of ternary Fe-W-P film was investigated by adjusting the composition of plating solution. The results showed that the deposition rate increases with the increase of NaOH and NaH2PO·2H2O. However, increasing Na2WO4·2H2O concentration in bath will decrease the deposition rate, indicating the inhibiting effect of Na2WO4·2H2O on Fe-W-P electroless plating.
出处
《广东化工》
CAS
2009年第8期56-56,75,76,共3页
Guangdong Chemical Industry