摘要
本文从择优取向材料的受力边界条件出发.提出了一种计算择优取向材料X射线弹。性质的近似模型─—加权Hill模型并用这一简化模型计算了一些模型材料的X射线应力测试曲线.为验证新模型,实测了电镀及电刷镀Cu膜的应力实验结果与用新模型计算结果符合得较好从而解释了等离子辅助化学气相沉积(PCVD)TiN膜应力测试曲线的低ψ角弯曲现象.指出这种弯曲是由PCVDTIN中存在的柱状晶定向排列引起当低ψ角弯曲而高ψ角具有线性区段时。
Based on the boundary conditions for prefer--oriellted polycrystals under loading,a new model for the calculation of X--ray elastic constallts (XEC) for prefer--oriented materials,the weighted Hill model, is proposed. The model is applied to calculate the X--my stress measurement curves of some model materials. In order to check the model, the stresses in electroplated and brush--plated copper films are measured. The experimelltal results have good comparison with the calculated results. This helps to explain the low op angle curVature of the stress measuremellt curve for plasma enhanced chemical vapor deposition (PCVD) TiN films. It is mainly caused by the columnar structure exsisted in the PCVD TiN films. When the stress measurement curve has a linear zone at the high op angle, it is suggested to use the slope of the linear zone for the stress calculation.
出处
《金属学报》
SCIE
EI
CAS
CSCD
北大核心
1998年第6期667-672,共6页
Acta Metallurgica Sinica
基金
国家自然科学基金!59581006
西安交通大学金属材料强度国家重点实验室开放基金
关键词
金属
择优取向
弹性性质
加权Hill模型
X射线
preferred orientation, thin film, X--ray elastic constant(XEC), weighted Hill model, X--ray stress measurement