原电池沉积技术工艺条件对SrMoO_4薄膜结构与形貌的影响(英文)

Influence of Processing Conditions on the Structure and Morphology of SrMoO_4 Films Prepared by Galvanic Cell Deposition Technique

室温下,在Sr(OH)2溶液中采用原电池方法直接制备了高晶态SrMoO4薄膜.通过XRD和SEM技术系统探讨了反应时间、溶液pH值和外加氧化剂等工艺条件对制备的SrMoO4薄膜的结晶性和表面形貌的影响.结果表明,电化学反应时间、溶液pH值和外加氧化剂对SrMoO4薄膜的晶体结构和表面形貌具有重要的影响:随着反应时间的增加,薄膜的结晶性和形貌会改善;在较高的溶液pH值条件下,SrMoO4晶粒沿c轴择优生长;当加入适量的过氧化氢氧化剂时,可加快SrMoO4晶粒的生长,但会产生团聚现象.

Highly crystallized SrMoO4 films have been prepared directly in strontium hydroxide solution by a galvanic cell method at room temperature. The influences of the processing conditions including reaction time, pH value of solutions as well as added oxidant （H2O2 solution） on the crystal structures and morphologies of the asprepared SrMoO4 films were discussed systematically by through XRD and SEM measurements. Our results show that the electrochemical reaction time, pH value and the added oxidant have an important effect on the crystallinity and morphology of the as-prepared SrMoO4 films. When the galvanic cell reaction time increases, the morphology and crystallinity of SrMoO4 films are improved; at the higher pH value of solution, SrMoO4 grains have preferential growth in c axis. After adding adequate hydrogen peroxide solution, the grain growth is promoted, and the grains have serious aggregation.