摘要
目的:应用基于体素的脑形态测量学方法,比较缺陷型与非缺陷型精神分裂症患者大脑白质结构损害的差异。方法:采用GE1.5TMRI成像系统,对缺陷型精神分裂症(n=10)、非缺陷型精神分裂症(n=11)及正常对照(n=15)进行全脑扫描,获取脑解剖结构MRT1图像。随后在SPM2平台上使用VBM工具箱逐例进行全自动数据分析,再进行成组t检验。结果:与正常对照相比,缺陷型患者的白质密度降低区域主要是左侧额叶回下,而非缺陷型患者为左侧额叶回下、右颞中回、右枕叶舌回以及胼胝体。两型患者的比较显示,缺陷型患者双侧额上回以及右侧顶叶的白质密度低于非缺陷型组,而左侧额内侧回的白质密度高于非缺陷型组。结论:这是第一项运用VBM法考察缺陷型与非缺陷型患者之间脑白质损害不同的形态学研究。研究结果为缺陷型患者额-顶环路受损的假说提供了新的证据。
Objective: To examine the differences in the structure of brain white matter among deficit schizophrenia, nondeficit schizophrenia and healthy controls by using voxel-based morphometry (VBM). Methods: 10 deficit schizophrenic patients, 11 nondeficit patients and 15 healthy comparison subjects participated in the study. All the subjects were scanned by GE 1.ST MRI system. Whole brain, voxel-wise analyses of regional white matter volume were conducted by the VBM toolbox on the SPM2. T-test was then used for the comprison between groups. Results: Compared to the healthy controls, deficit schizophrenic patients significantly decreased the density of white matter in the left frontal lobe (sub-gyral), while the nondeficit patients showed the decreasion in the left frontal lobe (sub-gyral), fight middle temporal gyms, right lingual gyrus, and corpus caUosum. Relative to the nondeficit schizophrenic patients, deficit patients had significant regional white matter decreases in the bilateral superior frontal gyrus and right parietal lobe (sub-gyral) and increases in the left medial frontal gyrus. Conclusion: To our knowledge, this is the first VBM study to show the white matter differences between deficit and nondeficit schizophrenia. These findings provide further support for altered frontal- parietal network in deficit schizophrenia.
出处
《中国临床心理学杂志》
CSSCI
CSCD
2009年第4期387-389,393,共4页
Chinese Journal of Clinical Psychology
基金
国家自然科学基金青年科学基金项目资助(30700236
30800253)
教育部高等学校博士学科点专项科研基金新教师基金资助(20070533067)
关键词
精神分裂症
缺陷型
磁共振成像
基于体素的形态学分析
白质
Deficit Schizophrenia
Magnetic resonance imaging (MRI)
Voxel-based morphometry (VBM)
White matter