大屏幕场致发射显示器薄膜型精细金属电极的研制

Fabrication on Fine Thin-Metal Electrode of Large Screen Field Emission Display

在洁净的玻璃基底溅射Cr-Cu-Cr复合薄膜,利用光刻和湿法刻蚀技术制备了大屏幕场致发射显示器薄膜型精细金属电极。讨论了不同腐蚀液对金属Cr刻蚀的影响,借助视频显微镜和台阶仪测试刻蚀后的电极形貌,结果表明,用质量比为6∶3∶100的KMnO4、NaOH和H2O的混合液腐蚀Cr膜的刻蚀速率平稳,刻蚀后的Cr电极边缘整齐,内向侵蚀少。此外,分析了FeCl3刻蚀液对Cu膜的刻蚀机理,讨论了刻蚀液在静置和循环条件下对制备FED薄膜型精细电极的影响,借助视频显微镜测试刻蚀后的电极形貌,结果表明,FeCl3刻蚀液在循环条件下刻蚀Cu膜速度均匀,刻蚀后电极边缘整齐。

Cr-Cu-Cr composite films were deposited on the surface of clean glass substrates by magnetron sputtering, and the fine thin-metal electrodes of large screen field emission display （FED） were fabricated by photolithography and wet chemical etching techniques. The influence of different etchants on the etching ratio of Cr film was discussed and the electrode image was observed by video microscopy and profilometer. It showed that the etching ratio of Cr film was steady and the electrode with less erosion was neatly in the mixture etchants of potassium permanganate, sodium hydroxide and water with the mass ratio of 6 ： 3 ：100. In addition, the etching mechanism of FeCl3 etching Cu film was analyzed. The recurrent and quiescent etchants affected on the preparation of fine thin-metal electrode was discussed and measured by video microscopy. The result showed that the etching ratio of Cu film was symmetrical and the edge of electrode was tidy in the recurrent etchants.