等离子体沉积非晶SiO_x:H纳米膜层改性医用NiTi合金研究

The study of amorphous SiO_x:H nanocoated on biomedical NiTi alloy by low-temperature plasma deposition

采用等离子体沉积技术在医用NiTi合金表面制备非晶SiOx：H纳米膜层，并对改性后材料表面化学及膜层晶体结构等进行表征。结果表明，通过控制TMS和Ox两种单体流速比和沉积时间，可控制材料表面亲疏水性和SiOx：H纳米膜层厚度。反应沉积的SiOx：H具有非晶的结构。其最优化条件为：卢（TMS）：μ（O2）-1：4，系统压力3．33Pa，D．C5W，沉积时间4min。所制备的膜层厚度约为45nm，表面去离子水接触角为30～40°。SiOx：H纳米膜层改性NiTi合金表面可提高材料的抗腐蚀性能。

Low-temperature plasma deposition technique was used to prepare amorphous SiOx ： H nanocoating on the surface of biomedical NiTi alloy. The surface chemistry and crystal structure of SiOx： H coating were characterized. The results showed that the surface hydrophilicity and thickness of SiOx ： H nanocoating could be controlled by adjusting the flow ratio of TMS：O2 and deposition duration. The prepared plasma SiOx ： H nanocoating is amorphous structure. The optimal condition of plasma coating is TMS ： O3 = 1 ： 4ml/min,4min,D. C 5W,system pressure 3.33Pa. Under the condition, the thickness of SiOz ： H coating is about 45nm,the water contact angle on surface is about 30-40°. The corrosion resistance of NiTi alloy could be improved with plasma SiOx ： H nanocoating.