脉冲电沉积氧化镍薄膜电致变色速率的研究

The Response Speed of Nickel Hydroxide Thin Films Prepared by Pulsed Electrodeposition Method

本文利用脉冲电沉积的方法制备氧化镍电色材料并研究了沉积条件对其反应速度的影响。发现在较大的脉冲电源开关比及适当的反向刻蚀电压下沉积的样品具有较快的反应速度。在此条件下反应速度的改进是由于材料内部含有较小的晶粒及较多的非晶组织，因而便于着色离子在其中的运动。实验中还发现脉冲电沉积的样品与直流电沉积的样品相比，具有较好的开路稳定性。

In this paper,the Nickel hydroxide electrochromic thin films were prepared by the pulsed electrodeposition method.The influence of the deposition parameters on the response speed during the coloring and bleaching processes was studied.It is found that the response speed is higher for the films prepared using deposition pulse with large on/off ratio and suitable reversed 'etching' pulse.This is due to the changement of the structure the grain size is smaller and the volume fraction of the amorphous phase in the films is higher,thus improving the movement of the coloring ions in the material.It is also found that the films prepared by pulsed electrodeposition method is more stable than that prepared by the direction current deposition method.