摘要
介绍了SiC材料的生长及器件制备技术,分析了目前SiC器件及集成电路等方面的研究现状,并讨论了存在的各种问题.
The Silicon carbide is expected to be a useful material which functions at extreme hightemperatures, and highfrequencies and in the highradiation environment because of its unique ability. Some obstacles of SiC crystal growth and device fabrication processes prevent development and application of SiC devices and integrated circuits. This paper introduces the growth of crystal SiC and device processes, surveys the present status of SiCbased semiconductor electronic devices and integrated circuits. In addition, the prospects for resolving the obstacles are discussed.
出处
《西安电子科技大学学报》
EI
CAS
CSCD
北大核心
1998年第4期478-482,共5页
Journal of Xidian University
基金
国防科技预研项目
国防科技基金