多孔阳极氧化铝模板法制备金属钌纳米线阵列

Preparation of Ru Nanowire Array into Anodic Aluminum Oxide Pores by Electrochemical Deposition Method

为了制备金属钌纳米线阵列结构,以多孔阳极氧化铝(AAO)为模板,采用直流电沉积的方法组装贵金属Ru纳米线阵列,并利用SEM,TEM对其微观形貌和结构进行了表征。结果表明:通过此法可以制得排列规整的Ru纳米线阵列,纳米线直径约为250 nm,与AAO模板实测孔径一致;并通过控制电沉积的时间,制备出不同长度的Ru纳米线,分析了电沉积时间对纳米线长度的影响。

The direct current electrodeposition method based on anodic aluminum oxide （AAO） was used to fabricate Ru nanowire array. Its morphology and struc- ture were characterized by SEM and TEM techniques. The results indicated that the well-ordered Ru nanowi- re array could be obtained and the diameter was about 250 nm, template which was consistent with the diameter of the pores. Besides, Ru nanowire of different length was obtained by changing the electrochemical deposition time, and the influence of electrodeposition time on the length of nanowires was discussed.