摘要
从激光分离膜的热损伤原理出发，建立了1064nm波长激光分离膜的损伤方程，并给出了损伤阈值的求解过程，在理论上分析了1064nm波长激光对SiO2薄膜材料的损伤特性；文中运用仿真方法得出激光照射过陧中薄膜内温度场随杂质位置不同的分布曲线。
In this paper, the damage equation of laser separation membranes at a wavelength of 1064 nm was established, based on the thermal damage principle of laser separation membranes, and a damage threshold of the solution process was presented. Besides, the damage characteristics of SiO2 thin film which was caused by the laser at 1064 nm were analyzed in theory, and the distribution curve was gained by the method of simulation, which showed the change of temperature field in the thin film along with the difference of impurity position in the process of laser radiation.
出处
《海军航空工程学院学报》
2009年第4期469-471,共3页
Journal of Naval Aeronautical and Astronautical University
基金
海军航空工程学院基础研究基金(HYJC200916)
关键词
激光
薄膜材料
温度场
损伤阈值
laser
thin film materials
temperature field
damage threshold
