期刊文献+

等离子体吸收对飞秒激光烧蚀绝缘材料的影响

Absorption Affection of Plasma to Femtosecond Laser-induced Breakdown Threshold in Dielectric
下载PDF
导出
摘要 以自由电子运动的速率方程模型为基础,研究了飞秒脉冲激光对绝缘材料的烧蚀机理,考虑了等离子体对激光能量的吸收效应,建立了激光强度与电子数密度及等离子体吸收系数三者相互耦合的数学模型,计算出飞秒激光烧蚀绝缘材料时的烧蚀阈值,分析了考虑等离子体吸收效应对烧蚀阈值的影响,通过与不考虑等离子体吸收所得结果相比较说明该效应是影响烧蚀阈值的一个重要因素。 Based on rate equation of electron evolution, the mechanisms of ultra-short pulse laser induced breakdown threshold in dielectric is studied. The plasma's absorption to the laser energy is taken into account. The model including laser intensity, the coefficient of the plasma's absorption and the electron density is set up and the fluenca of ultra-short pulse laser-induced breakdown threshold is calculated. The model results show the identity with the experimental results. The affection to the fluence with plasma's absorption is gotten and analyzed, it is concluded that this element can not be ignored by comparing the results with or without plasma's absorption.
出处 《机械制造与自动化》 2009年第4期11-14,共4页 Machine Building & Automation
基金 国家自然科学基金(No.50275026) 江苏省自然科学基金(BK2002060)资助项目
关键词 飞秒激光 烧蚀阈值 电子密度 等离子体 femtosecond laser breakdown threshold electron density plasma
  • 相关文献

参考文献11

  • 1Chichkov B N, Momma C, Alvensleben F V, et al. Femtosecond, picosecond and nanosecond laser ablation of solids[ J]. Appl Phy A, 1996(63) : 109-115.
  • 2Stuart B C, Fert M D, Herman S. et al. Nanosecond-to-femtosecond laser-induced breakdown in dielectrics [ J ]. Phy Rev B, 1996, 53(4) : 1749-1761.
  • 3Fan C H, Longtin J P. Modeling optical breakdown in dielectrics during uhrafast laser processing[ J ]. Appl Opts, 2001,40 ( 18 ) : 3124-3131.
  • 4Jiang L, Tsai H L. Prediction of crater shape in femtosecond laser ablation of dielectrics[ J], J Phys. D.. Appl Phys, 2004 (37) : 1492-1496.
  • 5Fan C H, Sun J, Longtin J P. Plasma absorption of femtosecond laser pulses in dielectrics [ J ]. Jounal of Heat Transfer, 2005 (124) : 275-283.
  • 6Hammer D X, Jansen E D, Frenz M, et al. Shielding properties of laser-induced breakdown in water for pulse durations from 5 to 125 fs[J]. Appl Opts, 2005, 36(22) : 5630-5640.
  • 7Noack J, Vogel A. Laser-induced plasma formation in water at nanosecond to femtosecond time scales : calculation of thresholds, absorption coefficients, and energy density[ J]. IEEE J Quantum Electronics, 2006, 35 (8) : 1156-1167.
  • 8Choi T Y, Grigoropoulos C P. Plasma and ablation dynamics in ultrafast laser processing of crystalline silicon [ J ]. J Appl. Plays, 2007, 92(9) : 4918-4925.
  • 9Rethfeld B, Kaiser A, Vlcanek M, et al. Ultrafast dynamics of nonequilibrium electrons in metals under femtosecond laser irradiation[J]. Phy Rev B, 2007,65(214303): 1-11.
  • 10Collet J H. Screening and exchange in the theory of the femtosecond kinetics of the electron-hole plasma [ J ]. Phy Rev B, 2007, 47(16) : 10279-10290.

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部