物理气相沉积TiN涂层结合力的研究现状与展望

Research and Prospect on Binding Force for PVD TiN Coating

物理气相沉积涂层质量指标主要通过涂层与基体结合强度来评定,因此,结合力决定了涂层是否可用。镀层的结合力强度既取决于膜/基界面的物理和化学相互作用,同时也取决于界面区的微观结构。本文阐述了薄膜中残余应力形成的原因,并分析了其引起的机理。综述了中间层Ti薄膜,梯度镀层及渗氮层与基体界面结合力的关系,从而提高界面结合强度。为合理设计PVD新型涂层提供依据。

The coating quality gotten by physical vapor deposition（PVD） is mainly evaluated through the bonding strength between the coating and the substrate, therefore the binding force decides whether the coating is availaible. The bonding strength of coating depends on physical and chemical interactions at the film / matrix interface, and on the microstructure in the interface section. In this paper, the reason and its mechanism formed residual stress in thin film is expouded. It is summarized that the Ti film gradient coat- ing and the nitriding layer are related to the bonding force of matrix interface, so as to improve bonding strength of the interaction, and provide a basis for the rational design of new PVD coating.