离子印迹技术及其在重金属污染治理和回收中的应用

Application of ion imprinting technology in heavy metal waste treating and recycling

综述了国内外离子印迹技术在金属离子污染治理和回收利用方面的研究现状和进展。对本体聚合、原位聚合、沉淀聚合、表面分子印迹技术、膜技术、微乳液聚合、原子转移自由基聚合等离子印迹聚合物的制备方法进行了比较、分析和总结,重点对离子印迹技术在重金属污染治理和回收利用方面进行述评。除了报道离子印迹技术在Cu^(2+)、Fe^(3+)、Hg^(2+)、Zn^(2+)、Cd^(2+)、U^(6+)等金属离子污染治理的成功案例外,还特别介绍了几种表面离子印迹聚合物制备采用的材料,如壳聚糖、硅胶、菌丝体。研究表明,与传统方法制备的聚合物相比,离子印迹聚合物的吸附容量和吸附速率大幅提高,尤其是离子印迹聚合物微球和表面印迹聚合物,对目标离子有突出的选择性。离子印迹聚合物因其可靠的机械稳定性、识别能力、易解吸和再生等性能,在离子分离、净化和回收领域已广为人们所接受,并为金属离子污染治理和回收的工业应用提供了技术基础。最后探讨了离子印迹技术研究领域面临的问题和趋势。

This paper is aimed to give a general review on the current status and progress of ion imprinting technology and its application in metal ion pollution and recycling use at home and abroad. Different processes of preparation of ion imprinting polymers, for example, bulk polymerization, in-situ polymerization, precipitation polymerization, surface molecular imprinting technique, membrane technology, micro-emulsion polymerization and ATRP （atom transfer radical polymerization） , with their performance compared, analyzed and generalized. In this review, the prominence is given to the discussion and summarization of ion imprinting technology in treating heavy metal pollution and recycling use in different contexts. By nature, ion imprinting technology can successfully be applied to treat metal contaminations, such as Cu^2 ＋, Fe^3＋, Hg^2＋ , Zn^2＋, Cd^2 ＋ , U^6＋ etc. In addition, we have specifically introduced ion imprinting polymers based on surface of different materials, such as chitosan, silica, mycelium. From reading of the reports in literature, it can be concluded that the adsorption capacity and adsorption rate of ion imprinting polymers can be heightened in varying degrees as compared to traditional polymers, especially ion imprinting miscrospheres and ion surface imprinting polymers, which enjoy outstanding selectivity on the target ions. In summary, it can be said that ion imprinting polymers have such characteristics as promising mechanical stability, recognition capability, easy to be eluted and regenerated, thus, making its application widely accepted in ion separation, purification and recovery progresses and providing a foundation for its industrial application in treating metal ion pollution and recycling. Discussions about the problems of ion imprinting technology and developing trends are extended at the end of the paper.