组合法优化Ti掺杂Zn-Al合金薄膜的耐腐蚀性能(英文)

Combinatorial Optimization for the Anti-Corrosion Properties of Ti Doped Zn-Al Alloy Films

应用组合技术,通过离子束溅射法制备了Zn-Al-Ti合金薄膜材料芯片(其中wAl∶wZn=55%∶45%(w,质量分数)),表征了热处理后薄膜的耐腐蚀性能,研究了Ti掺杂量对薄膜耐腐蚀性能的影响.在Ar+5%(φ,体积分数)H2混合气氛中,经200℃扩散1h,再经370℃热处理2h后可以得到高质量的合金薄膜.通过X射线衍射仪(XRD)和扫描电子显微镜(SEM)分别对热处理后的典型样品进行相结构和形貌表征.使用电化学方法测试样品的耐腐蚀性能.结果表明,Ti适量掺杂样品的腐蚀速率明显下降,其中Ti掺杂量为6.0%(w)的Zn-Al-Ti合金薄膜(94.0%(w)Zn-Al,其中wAl∶wZn=55%∶45%)具有最优异的耐腐蚀性能,其原因在于,Ti适量掺入后晶粒明显细化,表面更为致密,且钝化作用增强.

A Zn-Al-Ti material chip was fabricated by combinatorial technology using an ion beam sputtering method. The anti-corrosion properties of the Zn-Al alloy film and Ti doping effects on its corrosion resistance were investigated. High quality alloy films were obtained using low-temperature diffusion at 200 ℃ for 1 h combined with high-temperature crystallization at 370℃ for 2 h in Ar＋5% （φ volume fraction） H2 atmosphere. X-ray diffraction （XRD） and scanning electron microscope （SEM） were also used to characterize the structure and surface morphology of typical samples. The anti-corrosion behavior of samples was studied by electrochemical methods. Results indicated that the corrosion rate decreased markedly when a small amount of Ti was doped in the Zn-Al binary compositions. The Zn-Al- Ti alloy film doped with 6.0% （w, mass fraction） Ti （94.0% （w） Zn-Al with WAl：WZn=55%：45% showed the best anticorrosion behavior mainly because the small amount of Ti dopant developed fine grains, made the surface denser, and enhanced its passivation behavior.