摘要
介绍了一种新的电沉积非晶态Ｆｅ－Ｎｉ合金的方法。用这种方法在室温下电沉积出的Ｆｅ－Ｎｉ合金镀层外观接近镜面。经Ｘ－射线衍射及等离子光谱分析（ＩＣＰ－ＡＥＳ）证实，所获得的Ｆｅ－Ｎｉ合金镀层为非晶态结构，镀层中Ｆｅ和Ｎｉ含量分别为７３％～７７％和２０％～２４％，同时含有１．５％～５．０％的Ｐ和少量的Ｃｒ和Ｂ。对电沉积的工艺条件、光亮剂ＨＡＢ１、ＨＡＢ２和添加剂ＨＡＴ的影响进行了探讨。
Abstract A newly developed technology for electrodeposition of amorphous FeNi alloys at room temperature was described. The surface of amorphous FeNi alloys electrodeposited were approximate to that of mirror. The ICPAES and XRD experiment results showed that the FeNi alloys are amorphous alloys and contain 77%￣73% Fe, 24%￣20% Ni and a little other elements such as P,B. The effects of operating parameters on thickness and brightness of the plated amorphous FeNi alloys were also studied.
出处
《材料保护》
CAS
CSCD
北大核心
1998年第9期19-21,共3页
Materials Protection
基金
国家自然科学基金
