摘要
首先使用有限元分析方法求解磁控溅射电磁场的分布,然后结合受力分析,仿真了单电子运动轨迹并较好地呈现螺旋形状,同时模拟出多粒子束的靶面位置分布以及刻蚀形貌图,最后把计算结果与实验中靶面刻蚀形貌进行对比,所求结果与实验测量数据吻合。
Based on the FEA of static electromagnetic field distribution on target surface in magnetron sputtering system under loading conditions, the movement path of single charged particle was simulated and showed an upward spiral. Meanwhile, the distribution of particle beams on target surface and etched profile were simulated. Then, the measured and simulated profiles of etched target surface were compared,and the results showed that they are coincided.
出处
《真空》
CAS
北大核心
2009年第5期14-17,共4页
Vacuum
基金
自然科学基金(60806021)
国家863计划(2007AA03Z424)
新世纪优秀人才计划(NCET-06-0812)
关键词
粒子模拟
磁控溅射
电磁场分布
刻蚀形貌
simulation
discharge particles
magnetron sputtering
electromagnetic field distribution
etched profile
