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1.3μm低阈值InGaAsP/InP应变补偿MQW激光器的LP-MOCVD生长 被引量:2

Low Threshold 1.3 μm InGaAsP/InP Strained Compensated Multi quantum Well Lasers Grown by LP MOCVD
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摘要 报道了用低压金属有机物化学气相淀积(LP-MOCVD)方法外延生长InGaAsP/InP应变补偿多量子阱结构。用此材料制备的掩埋异质结(BH)条形结构多量子阱激光器具有极低阈值电流4~6mA。20~40℃时特征温度T0高达67K,室温下外量子效率为0.3mW/mA。 A 1.3 μm InGaAsP/InP strained compensated multi quantum wells structure grown by low pressure metalorganic chemical vapor deposition (LP MOCVD) was proposed. The threshold currents of buried heterostructure (BH) MQW lasers with this strained layers structure were 4 ̄6 mA mostly. The characteristic temperatures up to 67K were observed for the devices under a temperature between 20 ̄40℃, the single facet slope efficiency is 0.3 mW/mA at room temperature.
出处 《中国激光》 EI CAS CSCD 北大核心 1998年第9期785-788,共4页 Chinese Journal of Lasers
关键词 应变补偿 激光器 LP-MOCVD 半导体激光器 strained compensated, InGaAsP, laser, LP MOCVD
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