非晶碳氮薄膜的X射线光电子能谱研究

X-ray Photoelectron Spectroscopy Analysis of α-CN_x Films

采用空心阴极等离子体化学气相沉积法,在甲烷-氨气、氢气混合气体体系下,制备出了非晶碳氮薄膜。利用原子力显微镜(AFM)及X射线光电子能谱(XPS)对薄膜的表面形貌、成分及微观结构进行了测试和表征。结果表明,薄膜的表面光滑、致密,均方根粗糙度小于0.5 nm;薄膜中的氮含量随NH3(H2)流速的增加呈现降低的趋势,sp2C-N及sp3C-N键含量均随氮含量的增加而增加。

Amorphous carbon nitride （α-CNx） films were fabricated by plasma enhanced chemical vapor deposition technology in methane-ammonia-hydrogen system, in which the plasma was excitated by the hollow cathode glow discharge. The surface morphology, composition and microstructure of the deposited film were characterized by atomic force microscopy （AFM） and X-ray photoelectron spectroscopy （XPS）. Results from the measurement indicate that the surface morphology is smooth and dense with RMS roughness less than 0.5 nm and the nitrogen content in the film reduces with increasing NH3 （H2） flow rate, the content of sp2C--N and sp3C--N chemical bonds both rise with enhanced nitrogen content in the film.