改善生长层表面平整度,提高Low-E膜层的性能

Increasing the Performance of Low-E Film by Improving Surface Smoothness of Growth Layer

通过对Low-E膜系中的ZnO生长层的研究及对其进行离子轰击处理,给出了以适度的离子轰击处理的方式,使得ZnO生长层的平整度得以改善,从而可降低Low-E镀膜玻璃的面电阻,提高对近红外线的反射。即提高了整体Low-E膜层的质量。

The suitable ion bombardment conditions were obtained by investigation of growth layer of ZnO , which makes better surface smoothness of the growth layer , reduces the sheet resistance of Low-E glass and increases reflectance of near IR rays