占空比对微球a-C:H薄膜制备的影响

Influence of duty ratio on the fabrication of a-C:Hfilm on microshell

采用低压等离子体化学气相沉积方法(LPPCVD),以反式二丁烯(T2B)和氢气(H2)为工作气体,利用间歇跳动模式在微球表面制备30μm厚a-C:H涂层.利用原子力显微镜(AFM)和X射线照相技术对涂层表面形貌及壁厚均匀性进行表征,结果表明:随占空比减小,制备出的微球a-C:H薄膜表面粗糙度呈下降趋势,而壁厚均匀性随占空比的减小变化不明显;当占空比为1/5时,在直径为(280±50)μm的聚乙烯醇-聚苯乙烯(PVA-PS)双层球表面制备出30μm厚的a-C:H涂层,表面均方根粗糙度(RMS)低于30 nm;占空比为1/7时,不能维持微球的稳定跳动.

Using low-pressure plasma chemical vapor deposition （LPPCVD）, with trans-2-butene and hydrogen as the precursors, we have successfully deposited 30 μm CH coatings on microshells in intermittent bounce mode . The surface finish was measured by atomic force microscopy （AFM）, It was found that the surface finish was improved greatly with reduced duty ratio. When the duty ratio was 1/5, the surface roughness was less than 30 nm for the 30 μm thick a-C： H film. Uniformity of a-C： H films were measured by X-rayradiography. The results showed that the influence was little of duty ratio to the uniformity of a-C： H film. When the duty ratio was 1/7, microsheIls could not keep on bouncing.