摘要
采用扫描电镜(SEM)、能谱仪(EDS)、X射线结构衍射仪(XRD)及拉伸实验等方法,研究了铀(U)上磁控溅射A l镀层在480℃,2小时,60 MPa条件下热等静压(H IP)处理对界面特性以及膜基结合强度的影响.结果表明:经H IP处理后,镀层密度达到了其理论密度;镀层由柱状晶转变为致密的层状结构,在界面处A l、U元素形成了互扩散,并生成了金属间化合物UA l2和UA l3;膜基结合形成了冶金结合,结合强度有所增强.
The effect of hot isostatic pressing（HIP） on interface characteristics and adhesion strength of aluminum coating on uranium substrate were investigated by scanning electron microscopy （SEM） , energy dispersive spectrometer（EDS） ,X-ray diffraction（XRD）and tensile tests. The aluminum coating was prepared by magnetron sputtering on uranium and then HIP-treated under 60MPa at 480℃ for 2 h. The results show that after HIP treatment, the density of the coating reaches its theory value, and the microstructure of which changes from a columnar structure to a lamellar one. Intermetallic compounds UAl3 and UAl2 were grown at the interface due to the interdiffusion of uranium and aluminum, forming a metallurgical bonding between the coating and substrate therefore the adhension strength increases.
出处
《腐蚀科学与防护技术》
CAS
CSCD
北大核心
2009年第5期456-459,共4页
Corrosion Science and Protection Technology
关键词
热等静压
U/Al镀层
界面特性
hot isostatic pressing
uranium/aluminum coating
interface characteristics
