本底真空度对非平衡磁控溅射C/Cr复合镀层性能的影响

Effect of the background vacuum degree on the properties of the C/Cr coating deposited by non-equilibrium magnetron sputtering

采用非平衡磁控溅射在GW93镁合金表面制备了镀C/Cr复合镀层,分析了不同本底真空度下在GW93镁合金表面进行非平衡磁控溅射镀C/Cr复合镀层的硬度、耐蚀性、膜基结合力,摩擦系数等。结果表明,非平衡磁控溅射镀C/Cr复合膜层,本底真空度在8.8×10-3～1.0×10-1Pa范围内,镀层硬度与本底真空度成反比,当其为8.8×10-3Pa时,镀层硬度最低为1397Hv0.05,镀层使基体自腐蚀电位提高到-0.940V,显著改善镁合金的耐蚀性,结合力最高可达8.11N,镀层的摩擦系数最低达到0.05。本底真空度对C/Cr复合镀层相组成没有显著影响,不同真空度下的C/Cr复合镀层均以非晶为主。

The hardness, corrosion resistance, bonding force between coating and matrix and friction coefficient of the C/Cr composite coating deposited by non-equilibrium magnetron sputtering were analyzed. The results showed that the hardness of the coating is inversely proportional to background vacuum degree. In the scope of 8.8 × 10^-3 and 1.0 × 10^-1 Pa,when the background vacuum degree is 8.8 × 10^-3Pa, its hardness is the poorest, i. e 1397Hv0.05, but the corrosion resistance is greatly improved, the self-corrosion voltage is --0. 940V , the bonding force between coating and matrix is 8. llN and the friction coefficient is 0.2. The phase constitution aren＇t significantly influenced by background vacuum degree. The C/Cr composite coating are amorphous in different background vacuum degree.