摘要
采用室温磁控溅射技术在镁合金(AZ91D)表面制备了CNx/SiC/Ti(氮化碳/碳化硅/钛)多层膜(SiC、Ti为中间层),研究了CNx薄膜的纳米压痕行为和摩擦磨损性能.结果表明:CNx薄膜具有低的纳米硬度(6.67GPa)、低的弹性模量(54.68GPa)和高的硬度与弹性模量比值(0.122);在以氮化硅球为对摩副的室温干摩擦条件下摩擦系数约为0.162,磨损率在10-6mm3/(m.N)级,薄膜经长时间(3.5h)磨损后未出现裂纹和剥落.分析表明,摩擦化学和硬度与弹性模量比值对摩擦系数和磨损率有重要影响.
The nano- indentation and friction/wear properties of CNx film in CNx/SiC/Ti （carbon nitride/silieon carbon/fi） multilayer thin films （SiC,Ti films as interlayer） deposited on Mg alloy （AZ91D） substrate using magnetron sputtering technique at room temperature were investigated. The results showed that the CNx film exhibited a low nano - hardness （6.67 GPa） and Young＇s modulus （54.68 GPa） but a high ratio of hardness to modulus （0. 122）. When sliding against a Si3N4 （ silicon nitride） ball using ball - on - disc friction and wear tester under dry sliding condition, the CNx film exhibited good friction/wear properties, i.e. friction coefficient was about 0. 162 and the special wear rate was in the order of magnitude of 10^-6 mm3/（m · N） without film cracking and delamination at interface after long sliding duration （3.5 h ）. It is believed that tribochemistry and high hardness -to -modulus ratio played key roles in friction reduction and wear resistance.
出处
《摩擦学学报》
EI
CAS
CSCD
北大核心
2009年第5期432-436,共5页
Tribology
基金
江苏大学优秀学术青年骨干培养对象基金资助
江苏省摩擦学重点实验室基金资助(kjsmcx06005)
关键词
镁基材
薄膜
纳米压痕
摩擦磨损
磁控溅射
Mg substrate, thin films, nanoindentation, friction and wear, magnetron sputtering
