Study of Three Different Types of Plasma Ion Sources

Study of Three Different Types of Plasma Ion Sources

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摘要 Three types of plasma ion sources designed, manufactured and optimized in the Accelerators and Ion Sources Department, Nuclear Research Center, Atomic Energy Authority are introduced. Different means were investigated to generate the discharge current and ion beam current extracted from the plasma. The various plasmas described include a DC glow discharge plasma, an arc discharge plasma and a radio frequency discharge plasma. Three types of plasma ion sources designed, manufactured and optimized in the Accelerators and Ion Sources Department, Nuclear Research Center, Atomic Energy Authority are introduced. Different means were investigated to generate the discharge current and ion beam current extracted from the plasma. The various plasmas described include a DC glow discharge plasma, an arc discharge plasma and a radio frequency discharge plasma.

作者 M.M.ABDELRAHMAN H.EL-KHABEARy

机构地区 Accelerators & Ion Sources Department

出处《Plasma Science and Technology》 SCIE EI CAS CSCD 2009年第5期604-608,共5页 等离子体科学和技术（英文版）

关键词 ion sources ionization processes sputtering and etching processes ion sources, ionization processes, sputtering and etching processes

分类号 TL629.1 [核科学技术—核技术及应用]

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Study of Three Different Types of Plasma Ion Sources

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