锑微电极的制备及化学镀镍反应界面pH值的原位测量

Development of Sb Microelectrode and In situ pH Measurement of Electroless Nickel Reaction Interface

利用电镀法制备了锑微电极，并对其性能进行了检测。所研制锑微电极的稳定性好、响应速度快、ｐＨ值敏感性高（３５～４０ｍＶ／ｐＨ），在高温酸性化学镀镍溶液中有较长的连续使用寿命。将该微电极用于化学镀镍体系中反应界面区ｐＨ值的原位测量，测得了化学镀镍过程中反应界面区ｐＨ值的波动，其最大波动幅值达１～２个ｐＨ值，为解释化学镀镍磷合金镀层层状结构的成因提供了可靠的实验基础。

Sb microelectrodes were prepared by plating. The results of testing show that they have excellent stability, quick responding speed, high pH sensitivity (35～40 mV/pH) and long service life in high temperature acidic Electroless Nickel (EN) bath. By using Sb microelectrode, the pH value in EN reaction interface was measured in situ . There exists the fluctuation of pH value, as EN plating continuing, the amplitude of fluctuation tends to decrease. The largest fluctuation amplitude can reach 1～2 pH value. The in situ pH measurement provides reliable experimental results for explaining the formation of EN layer structure deposit.