PECVD系统中Ar等离子体电子特性的研究

Studying on the Electron Charateristic of Argon Plasma in the PECVD System

利用自行设计的可移动Langmuir探针装置对PECVD系统中Ar等离子体中的电子平均能量和电子浓度随各工艺条件的变化规律进行了研究;并成功获得了Ar等离子体中的电子平均能量和电子浓度的轴向分布和径向分布规律。此外,文中还对电子浓度和电子平均能量随各工艺参数的变化规律进行了系统的理论分析。

Using an established movable Langmuir probe, the effect of technology parameters on the mean electron energy and the elecron density of argon plasma in Plasma--enhanced chemical vapor deposition （PECVD） system is investigated. Especially, the axial and radial distributions of the mean electron energy and the electron density are obtained. Morever, the dependence of electron characteristics on technology parameters is analyzed.