基于泰勒分布线阵特殊旁瓣技术的研究

A Technique Based on Taylor Distribution for Synthesis of Line-source Patterns Having Specified Sidelobe Behavior

提出了基于泰勒加权分布线阵特殊旁瓣要求的设计方法,其波束图是由给定的旁瓣级要求来设计的泰勒分布波束图,在实际需要的特殊旁瓣要求上,设计满足了要求的最窄波束宽度波束图。给出了相应的参数设计,并证明该设计能在要求的最大旁瓣级上获得最大阵增益。借助计算机对线阵进行波束图设计。结果表明,使用该方法设计的波束图能满足特殊旁瓣要求和最大阵增益。

A new method based on Taylor distribution for the synthesis of line-source aperture patterns having prescribed sidelobe is discussed, The design patterns requirements of this method are specified by Taylor weighting, approach the narrowest beamwidth for the given sidelobe behavior. The required design parameters are given. The specified sidelobe for those patterns having maximun gain for a given maximum sidelobe level are also presented. The computer beam forming on line-source aperture is optimized. The specified side lobe is obtained with the narrowest beamwidth using the proposed method. The method can be used in multifold application occasions on the beam forming design and optimization effectively.