摘要
讨论了制作大面阵矩底拱面状微透镜阵列的工艺条件，给出了氩离子束刻蚀制作红外焦平面用面阵微透镜的离子束刻蚀速率的经验关系式，通过实验获得了光电材料几种常用的氩离子束刻蚀速率与氩离子束能量之间的关系曲线，用扫描电子显微镜测量了所制微透镜阵列的微结构形貌特征。
In this paper,the technology conditions of fabricating photoresist microlens mask is discussed,the experimental equation of ion beam etching rate is given,the relation between the Ar ion beam etching rate and Ar ion beam energy are obtained,and the surface microstructures of the large area microlens array fabricated are measured by the scanning electron microscope(SEM).
出处
《微细加工技术》
EI
1998年第4期27-35,共9页
Microfabrication Technology
