摘要
对利用X射线光刻制作大高宽比硬X射线波带片的设计和制作工艺进行了研究。采用电子束光刻制作X射线光刻掩模,并利用X射线光刻制作最终的硬X射线波带片。采用对光刻胶结构加入支撑点的方法,大大提高了X射线光刻制作硬X射线波带片的高宽比。对所加入支撑点的布置策略进行了优化,使得支撑点所占的面积比例减小。所制作的波带片最外环宽度为200nm,厚度为2.8μm,具有优良的结构质量,预期可用于10keV到25keV波段,并具有优于250nm的成像分辨率。
The design and fabrication of high aspect-ratio hard X-ray zone plates by X-ray lithography are studied. The X-ray lithography mask was fabricated by electron beam lithography, and the final hard X-ray zone plates were fabricated by X-ray lithography. By integrating supporting points into the photoresist structure, the high aspect ratio of hard X-ray zone plates fabricated by X-ray lithography was greatly increased. The arrangement strategy of added supporting points was optimized to reduce the area ratio taken by the supporting points. High quality zone plates were achieved with an outermost zone width of 200 nm and a thickness of 2.8μm. The fabricated zone plates can be used for 10 to 25 keV hard X-rays, and imaging resolution better than 250 nm can be expected.
出处
《光电工程》
CAS
CSCD
北大核心
2009年第10期30-34,共5页
Opto-Electronic Engineering
基金
国家重点基础研究发展规划(2007CB935302)
教育部创新计划同步辐射研究生创新基金(批准号20070133S)资助项目
关键词
大高宽比
x射线波带片
X射线光刻
衍射效率
high aspect-ratio
X-ray zone plates
X-ray lithography
diffraction efficiency