摘要
研究了TiN/Ti多层膜不同温度下的微观结构和氧化行为。采用阴极弧离子镀沉积的方法制备了19层调制周期为200 nm的TiN/Ti多层膜及相应的TiN单层膜。采用高分辨场发射电子显微镜(HR–FESEM)、光学显微镜和X射线衍射仪(XRD)分别对膜层断面结构、表面形貌和物相进行分析。结果表明,随着加热温度的升高,TiN单层膜在350℃时开始出现局部剥落,550℃出现大范围的剥落,而多层膜未发生剥落;相对TiN单层膜,TiN/Ti多层膜具有层状结构,其抗氧化能力有一定的提高。结合试验结果,讨论了TiN/Ti多层膜和TiN单层膜的工作温度。
Microstructure and oxidation behavior of TiN/Ti mulfilayer coating were investigated. Cathode arc ion plating system was applied to prepare TiN/Ti multilayer coating with 19 sublayers and 200nm modulating period Relevant TiN monolayer coating was also prepared for comparision. High-resolution field emission scanning electron microscope （HR-FESEM）, optical microscope and X-ray diffraction （XRD） analysis were used to observe the cross-sectional microstructure, surface topography and phase, respectively. The experimental results showed that, with the heating temperature rising, partial area spalling at 350℃ and large area peeling at 550℃ occurred in the TiN monolayer coating and no evident spalling occurred in the TiN/Ti multilayer coating. As comparing to TiN monolayer, TiN/Ti multilayer had fine lamellate structure and the resistance to oxidation was improved. Finally, according to the experimental results, work temperature of TiN/Ti multilayer and TiN monolayer was discussed.
出处
《中国表面工程》
EI
CAS
CSCD
北大核心
2009年第5期20-25,共6页
China Surface Engineering
基金
国家重点基础研究发展计划973项目(2007CB607605)
国家自然科学基金资助项目(50721004)
