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大气常压等离子体弧清洗反应动力学模型和参数的研究 被引量:4

Study on Reactive Kinetics Model and Its Parameters during Atmospheric Pressure Plasma Arc Cleaning Contaminant from Metal Surface
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摘要 针对大气常压等离子体弧清洗金属表面的工艺,从反应动力学角度提出了一种新的研究方法.通过分析金属表面大气常压等离子体弧清洗的基本原理和清洗界面随时间移动的显著特点,根据清洗界面上的能量平衡条件,建立清洗界面的运动控制方程.在此基础上,采用四阶RUNGE-KUTTA法求出不同热流密度下清除界面位移规律,间接求得不同时刻所对应的清除百分比,进而结合反应动力学理论建立相关反应动力学数学模型以及计算活化能和反应频率因子相应反应动力学参数.以清洗金属表面润滑油污为例,建立了反应动力学模型,并采用称重法对其进行实验验证.结果表明:该模型不同时刻关于油污去除百分比的预测值与实验测量值相吻合;此外,清洗率与清洗界面处的氛围温度密切相关,随氛围温度的升高而增加.过高的氛围温度容易对基体造成损伤,存在一个理想的氛围温度阈值,该值介于分解温度与基体损伤温度之间. A novel method is put forward to study the cleaning mechanism of atmospheric pressure plasma arc (APPA). Based on the analysis of the principle of APPA cleaning metal surface and the characteristic of the cleaning interface, a governing equation was established with heat transfer equation and energy conservation on the moving interface. Using fourth-order Rounge- Kutta method, above equation was solved and removal percentages of the cleaning contaminant at different time were obtained. In virtue of reactive kinetics theory, a reactive kinetics model of metal surface cleaning using APPA was established on the base of above calculation results. Afterwards, reactive kinetics parameters such as activation energy and pre-exponential factor were calculated. Cleaning lubricant was taken as an example and its reactive kinetics model was verified with a weighting method. The results indicate that the predictive value of lubricant removal percentages gotten from this established reactive kinetics model are good consistent with those experimental value at the same cleaning time. Furthermore, the ambient temperature on the cleaning lubricant surface has a strong effect on its removal rate. The removal rate increases with the increase of the ambient temperature. To avoid the damage of metal substrate surface because of higher temperature and ensure the removal rate of the lubricant, the appropriate temperature which lies between the lubricant decomposition temperature and damage temperature of metal substrate under given calculation conditions should be determined.
出处 《应用基础与工程科学学报》 EI CSCD 2009年第5期737-745,共9页 Journal of Basic Science and Engineering
基金 国家自然科学基金资助项目(50775019)
关键词 大气常压 等离子体弧清洗 反应动力学 Arrhenius公式 atmospheric pressure plasma arc cleaning reactive kinetics model Arrhenius Equation
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共引文献42

同被引文献28

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