等离子体放电过程数值模拟

Numerical Simulation of Plasma Discharge Process

为了从机理上研究等离子体流动控制技术,必须研究等离子体的产生和发展过程。采用泊松方程和漂移-扩散方程对介质阻隔面放电进行数值模拟,得到了电子、离子以及电场分布随时间的变化。结果表明在暴露电极的2个方向都发生了放电,但电场力限制了电子向电极上方的运动,导致电极上方的等离子体密度很低;暴露电极上游没有植入电极,电子、离子无法在该区介质层上表面沉积,因此暴露电极上游的放电无法熄灭。植入电极上方大部分区域离子受到的平均电场力密度达到100.0 N/m^3,能够实现对气体流动的控制。

It＇s necessary to study the generating and development process of plasma for researching the mechanism of plasma-flow-control. The dielectric barrier surface discharge process is simulated using Poisson＇s equation and drift-diffusion equation and the distribution history of electron, ion and electric field is gained. The results show that discharge occurs at two sides of exposed electrode, but the effect of electric field limits electrons＇ movement to upper surface of exposed electrode, which leads to the plasma density on exposed electrode upper surface is low; electron and ion can＇t deposit on the upstream surface of exposed electrode without encapsulated electrode, so the discharge can＇t quench in exposed electrode upstream. The average electric field force density achieves 100.0 N/m^3 that can control airflow on the most region of encapsulated electrode upper surface.