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紫外纳米压印抗蚀剂的研究进展

The Progress of Study on UV Nanoimprint Resists
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摘要 本文介绍了纳米压印技术的基本原理。总结了紫外纳米压印抗蚀剂的种类以及组分。具体包括丙烯酸酯体系、环氧树脂体系和乙烯基醚体系的配方组成及单体合成方法。比较了各个体系的优缺点。本文还分析了目前国内纳米压印抗蚀剂的研究现状并对其研究方向进行了分析与展望。 This basic principles of nanoimprint lithography technology and the recent progress in the study of ultraviolet nanoimprint resists wore reviewed. The categories of photoresists for UV nanoimprint lithography and the compositions of each category were summarized. The synthesis of monomers and the composition of photoresists are introduced respectively. The photoresists mainly include acrylate system, epoxy resin system and silicon-containing vinyl ether system. The advantages and disadvantages of the photoresist systems are also presented. The present study situation and the development trend of UV nanoimprint resists were analyzed.
作者 肖时卓 邹应全
机构地区 北京师范大学化学学院
出处 《信息记录材料》 2009年第5期47-52,共6页 Information Recording Materials
关键词 紫外纳米压印抗蚀剂 纳米压印技术(NIL) 丙烯酸酯 环氧树脂 乙烯基醚 UV nanoimprint resists Nanoimprint lithography acryl ate epoxy resin silicon-containing vinyl ether
分类号 TQ31 [化学工程—高聚物工业]
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参考文献20

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二级参考文献15

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2009年 第5期

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