4Will Conley. Considerations in the development of deep UV photoresist material & processes[J]. Proc. SPIE, 1995, 2438 : 40-52.
5Richard S T, Robert A A, Aonrad G H, et al. High-Tg base-soluble copolymers as novolac replacements for positive photoresists[Jl. Polym . Eng. Sci . , 1986,26(16): 1096-1100.
6Chiang W Y, Lu J Y. Preparation and properties of Si-containing copolymer for near-UV resist. I. Poly (N-(4-hy- drophenyl) maleimide-alt-p-trimethylsilylstyrene)[J]. J. Polym. Sci. : Part A, 1991, 29: 399-410.
7Tawney P O, Synder R H, Bryan C E. The chemistry of rnaleimide and its derivatives. I . N-carbamylmaleimide [J]. Org. Chem., 1960,25(1): 56-60.
8Tawney P O, Synder R H, Conger R P. The chemistry of maleimide and its derivatives. II. Maleimide and N-methylolmaleimide[J]. Org. Chem., 1961, 26(1): 15-21.
9Ludwig Bauer, Stanley V Miarka. Stereospecific lossen rearrangements [J]. Org. Chem. , 1959, 24(12) : 1293- 1296.