摘要
文章叙述了采用金属有机物四异丙基钛（Ｔｉ［ＯＣ３Ｈ７］４］为钛温，在外加热ＰＣＶＤ设备上沉积Ｔｉ（ＣＮ）涂层。并对涂层进行了其显微硬度测量，扫描电镜（ＳＥＭ）观察和Ｘ射线衍射（ＸＲＤ）分析。结果表明，此法制备的Ｔｉ（ＣＮ）涂层其显微硬度可达标１５６００Ｎ／ｍｍ２，膜层结构仍为在状晶，Ｔｉ（ＣＮ）晶体的ｄ（２００）随着炉温的升高和Ｈ２．Ｎ２比的增大在逐渐变化。
The use of metallo-organic compound Ti(OC3H7)4 with auxiliary heating plasma assisted CVD of Ti (CN) coating is reported. The Ti(CN ) coatings were analyzed with SEM and XRD. The maximal microhardness value is 15 600 N/mm2, the morphology of coatings is columnar structure,and the d(200)-valuls of Ti(CN) films changed with the oven temperature and the ratio of H2 to N2.
出处
《真空电子技术》
1998年第5期36-39,共4页
Vacuum Electronics
基金
山东省自然科学基金
关键词
金属有机物
等离子体
四异丙基钛
碳氮化钛
Metallo-organic compound, Plasma,Ti (OC3H7)4, Ti (CN),Micro- analysis
