浅析光刻设备与技术的发展

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摘要阐述了光刻设备技术的的发展,描述了浸没式光刻技术、纳米压印光刻工艺设备基本原理、技术优势,并展望几种光刻技术的前景。

作者王桂林

机构地区西安卫光科技有限公司

出处《知识经济》 2009年第11期94-94,共1页 Knowledge Economy

关键词光刻设备技术发展浸没式光刻纳米压印光刻

参考文献1

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知识经济

2009年第11期

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