C_(60)薄膜的离子注入损伤研究

ION RADIATION DAMAGE OF C 60 FILMS 

在２００ｋｅＶ重离子加速器上，用１２０—３６０ｋｅＶ的Ｈ，Ｎ，Ａｒ和Ｍｏ离子注入Ｃ６０薄膜．对注入后薄膜的拉曼谱进行了分析．结果表明，不同离子注入Ｃ６０薄膜后，Ｃ６０的１４６９ｃｍ－１特征峰随注入剂量的增加均呈指数式下降，同时在１３００—１７００ｃｍ－１范围出现非晶碳峰，并逐渐增强，最终完全非晶化．而且１４６９ｃｍ－１拉曼峰的强度及Ｃ６０薄膜完全非晶化所对应的剂量与注入离子的种类和能量有关．进一步的分析表明，Ｃ６０分子的损伤主要是由注入离子的核能量转移所造成，与电子能量转移无关．Ｈ离子注入Ｃ６０薄膜后，１４６９ｃｍ－１处特征拉曼峰向短波方向非对称展宽。

Abstract The C 60 films have been implanted with 120—360keV H,N, Ar and Mo ions by using a 200keV heavy ion accelerator. The samples were investigated by Raman spectra. The results showed an exponential decrease of intensity for 1469cm -1 line depending on the kind of ions and dose. There appeared a structural transformation of C 60 to amorphous carbon at certain doses, which is correlated to the nuclear energy transfer. H ions implantation resulted in an asymmetrical broadening of 1469cm -1 line, which is due to the electronic energy transfer.