摘要
用射频共溅射技术和真空退火方法制备了埋入SiO2基底中的纳米Ge复合膜(nc-Ge/SiO2)。测量了不同温度退火后该复合膜的拉曼散射光谱,其结果与晶体Ge的拉曼谱相比,纳米Ge的拉曼峰位红移峰形变宽;用拉曼谱的参数计算了纳米Ge晶粒的平均尺寸。
Germanium nanocrystals embedded in SiO 2 glassy matrix have been prepared on glass substrates and Si(100) wafers by r.f. cosputtering and post annealing methods. Raman scattering spectra at various annealing temperature were measured. Compared with bulk Ge, a red shift and broadening of Raman scattering spectra were observed. According to the parameters of Raman scattering spectra, we calculated the average crystal size of nc Ge. The experimental results are in agreement with the phonon confinement theory.
出处
《光学学报》
EI
CAS
CSCD
北大核心
1998年第9期1265-1268,共4页
Acta Optica Sinica
基金
国家和甘肃省自然科学基金
关键词
拉曼散射光谱
纳米锗
晶粒尺寸
声子限域理论
germanium nanocrystal (nc Ge), Raman scattering spectra, crystal size, phonon confinement theory.