IBAD合成CN_x/NbN纳米多层膜

THE INVESTIGATIONS ON NANA-SCALE MULTILAYERS OF CN_x/NbN SYNTHESIZED BY IBAD

用离子束辅助沉积技术（IonBeamAssistedDeposition，IBAD）制成CNx／NbN纳米多层膜．研究了工艺参数（轰击能量，基片温度）对股的结构和性能的影响，分析表明，多层膜内的NbN为多晶结构．在轰击能量为400eV，基片温度为600℃时，得到了与β—C3N的晶面间距相对应的三条电子衍射环．基片温度的上升，膜层的硬度上升；轰击能量增大．炒股层的硬度表现为先上升后下降，最大显微硬度达41．81GPa．

Nano-scale multilayers of CNx/NbN have been prepared by ion beam sputtering deposition. The effects of such deposition parameters as substrate temperature, bombarding energy individual layer thickness, etc, were studied. TEM and X-ray analysis confirmed that the NbN layerswere polycrystalline. Diffraction rings from CNx layers were in good agreement with those of β-C3N4.With the increase of the substrate temperature, the hardness of the layers increases. When we increasethe bombardment energy, the hardness of the multilayers increases initially then decreases. A maximumof hardness of 41.81GPa was obtained.