Cu层和Mo层对NiFe多层膜巨磁电阻(GMR)的影响

Effect of Cu and Mo Layers on GMR of NiFe Multiayers

采用磁控溅射方法制备了ＮｉＦｅ／Ｃｕ和ＮｉＦｅ／Ｍｏ两个系列的多层膜，进行了结构、磁性和磁电阻测量，并对部分ＮｉＦｅ／Ｃｕ多层膜样品作了电镜分析。对于ＮｉＦｅ／Ｃｕ多层膜，在室温下测量到巨磁电阻随Ｃｕ层厚度振荡的第一、二、三峰。在ＮｉＦｅ／Ｍｏ多层膜样品中未发现巨磁电阻效应。讨论了非磁性层对多层膜的磁性、界面结构和巨磁电阻效应的影响。

The NiF/Cu and NiFe/Mo multilayers(MLs) were deposited by dc magnetron sputtering. The magnetoresistance and the magnetism of the MLs were measured, and the cross-sectional images of the NiFe/Cu MLs were analyzed by transmission electron microscopy (TEM). The three peaks of MR ratio for NiFe/Cu MLs were observed at room temperature as the thickness of Cu layer was varied, while no MR of NiFe/Mo MLs was found with the varied thicknesses of Mo. The dependence of GMR on interface structure was studied.